Joseph Cecchi

Professor

Education

Ph.D. Harvard University Physics, 1972

M.B.A. University of New Mexico, 2011

M.A. Harvard University Physics, 1969

B.A. Knox College Physics, 1968

Biography

Research

  • Micro- and nano-fabrication for semiconductor devices and interconnects
  • Plasma etching and plasma etch tools (Parallel Plate, RIE, ECR, ICP, TCP, Helicon)
  • Plasma diagnostics: RF measurements, optical emission, laser induced fluorescence, diode laser absorption spectroscopy, microwave interferometry
  • Chemical Vapor Deposition (CVD) and Plasma-Enhanced CVD (PECVD)
  • Micro-Electro Mechanical Systems (MEMS)
  • Atomic Layer Deposition (ALD) and Plasma-Assisted ALD (PA-ALD)
  • Molecular beam electric resonance measurements of rotational magnetic moments and hyperfine structure of diatomic molecules
  • Plasma physics, Plasma Transport, Plasma-materials interactions
  • Vacuum ultraviolet spectroscopy
  • Beam foil spectroscopy/vacuum ultraviolet spectroscopy of highly stripped atoms
  • Interaction of hydrogen and deuterium with Zr-alloy bulk getter
  • Polarization of atomic hydrogen by optical pumping and spin exchange
  • Plasma-excited supersonic atom sources (Ar, He) for metastable and reactive beam generation

Appointments In Teaching and Research

  • 1994 - Present Professor, Department of Chemical and Nuclear Engineering • University of New Mexico, Albuquerque, NM.2011-2012: Professor of Engineering, Masdar Institute of Science and Technology • Masdar City, Abu Dhabi, United Arab Emirates.
  • 1988 - 1994: Lecturer with Rank of Professor, Department of Chemical Engineering • Princeton University, Princeton, NJ.
  • 1984 - 1994: Principal Research Physicist, Plasma Physics Laboratory Princeton University • Princeton University, Princeton, NJ.
  • 1978 - 1984: Research Physicist, Plasma Physics Laboratory Princeton University • Princeton University, Princeton, NJ.
  • 1972 - 1978: Staff Physicist, Plasma Physics Laboratory Princeton University • Princeton University, Princeton, NJ.
  • 1969 - 1972: Research Assistant to Professor, Norman F. Ramsey Department of Physics • Harvard University, Cambridge, MA.
  • 1969 - 1972: Teaching Fellow, Department of Physics • Harvard University, Cambridge, MA.
  • 1967 - 1968: Research Associate, Physics Division Argonne National Laboratorys, Argonne, IL.

Academic Administrative Positions

  • 2011 - 2012: Provost, Masdar Institute of Science and Technology • Masdar City, Abu Dhabi, United Arab Emirates.
  • 2004 - 2011: Chair, Board of Directors The Science and Technology Corporation @ UNM • Albuquerque, NM.
  • 2001- 2009: Dean, School of Engineering • University of New Mexico, Albuquerque, NM.
  • 2000 - 2001: Interim Dean, School of Engineering • University of New Mexico, Albuquerque, NM.
  • 1994 - 2000: Chair, Department of Chemical and Nuclear Engineering • University of New Mexico, Albuquerque, NM.
  • 1991 - 1994: Director, SEMATECH Center of Excellence for Plasma Etching New Jersey Consortium.
  • 1987 - 1994: Director, Graduate Program in Plasma Science and Technology School of Engineering • Princeton University, Princeton, NJ.
  • 1979 - 1987: Head, Materials Physics Group, Plasma Physics Laboratory • Princeton University, Princeton, NJ.
  • 1987 - 1994: Head, Plasma Processing Group, Plasma Physics Laboratory • Princeton University, Princeton, NJ.

Teaching

  • ChNE 213 Electronic circuits
  • ChNE 461 Chemical Reactor Engineering.
  • ChNE 486/586 Statistical Design of Experiments for Semiconductor Manufacturing (newly developed).
  • ChNE 499/515 Sustainable Energy (newly developed).
  • ChNE 599 Masters Thesis.
  • ChNE 699 Dissertation.
  • ME 461 High Performance Engines (newly developed).

Patents

  • Method of Enhancing Selective Isotope Desorption from Metals, U.S. Patent No. 4,476,100, Issued: October 9, 1984.
  • Hydrogen Isotope Separation Utilizing Bulk Getters, U.S. Patent No. 4,976,938, Issued: December 11, 1990.
  • Hydrogen Isotope Separation Utilizing Bulk Getters, U.S. Patent No. 5,041,147, Issued: August 20, 1991.
  • Method and Apparatus for Coupling a Microwave Source in an Electron Cyclotron Resonance System, U.S. Patent No. 5,111,111, Issued: September 30, 1991.
  • Apparatus and Method for Uniform Microwave Plasma Processing Using TE11 and TM01 Modes, U.S. Patent No. 5,302,803, Issued: April 12, 1994.
  • Apparatus and Process for Producing High Density Axially Extended Plasmas, U.S. Patent No. 5,587,038, Issued December 24, 1996.
  • Method of Making Dense, Conformal, Ultra-Thin Cap layers for Nanoporous Low-k ILD by Plasma Assisted Atomic Layer Deposition, U.S. Patent No. 7,947,579, Issued May 24, 2011.
  • Ultra-Thin Microporous/Hybrid Materials, U.S. Patent No. 8,187,678, Issued May 29, 2012.

Selected Publications:

  • Y-B Jiang, G Xomeritakis, Z Chen, D Dunphy, D.J. Kissel, J.L. Cecchi, and C.J. Brinker, Sub-10 nm Thick Microporous Membranes Made by Plasma-Defined Atomic Layer Deposition of a Bridged Silsesquioxane Precursor, J. Am Chem. Soc., 129, 15446-15447 (2007).
  • J.L. Cecchi, C.J. Brinker, and Y-B Jiang, Ultra-Thin Conformal Pore-Sealing of Low-k Materials by Plasma-Activated Atomic Layer Deposition, ECS Transactions, 11(7) 167-176 (2007).
  • Y-B Jiang, N. Liu, H Gerung, J.L. Cecchi, and C.J. Brinker, J. Am. Chem., Nanometer-Thick Conformal Pore Sealing of Self-Assembled Mesoporous Silica by Plasma-Assisted Atomic Layer Deposition, Soc. 128, 11018 (2006)
  • S.M. Han, J.L. Cecchi, and J.J Russell, High Performance Engines: Fast Cars Accelerate Learning, Journal of Engineering Education, Chem. Eng. Educ. 37(3), 208 (2003).
  • M.E. Littau, M.J. Sowa, and J.L. Cecchi, Diode Laser Measurements of CFx Species in a Low-Pressure High-Density Plasma Reactor, J. Vac. Sci. Technol. A 20 (2002) 1603.
  • P. Gopaladasu, J.L. Cecchi, K.J. Malloy, and R. Kaspi, Response Surface Modeling of the Composition of AlAsySb1-y Alloys Grown by Molecular Beam Epitaxy, J. Cryst. Growth 225 (2001) 556.
  • M.J. Sowa, M.E. Littau, V. Pohray, and J.L. Cecchi, Fluorocarbon Polymer Deposition Kinetics in a Low-Pressure High-Density Inductively Coupled Plasma Reactor, J. Vac. Sci. Technol. A 18 (2000) 2122.
  • D.J. Stein, J.L. Cecchi, and D.L. Hetherington, Atomic Force Microscoy, Lateral Force Microscopy, and Transmission Electron Microscopy Investigations and Adhesion Force Measurements for Elucidation of Tungsten Removal Mechanisms, J. Mater. Res., 14, (1999) 3695.
  • D.J. Stein, K.L. Hetherington, and J.L. Cecchi, Investigation of the Kinetics of Tungsten Chemical Mechanical Polishing in Potassium Iodate-Based Slurries II: Roles of Colloid Species and slurry Chemistry, J. Electrochem. Soc., 146, (May, 1999).

Total Publications in Career:

  • Dr. Cecchi has authored more than 90 research publications in semiconductor manufacturing, plasma engineerig, and materials technology.